Hafnium(IV) Oxide (HfO2)
Purities:
99.999% (Spectro grade)
99.95% (Zr= <0.5%)
99.9% (Vacuum deposition grade)
99% (Zr= <2%)
Hafnium(IV) oxides are used in modern semiconductor devices and advanced metal oxide semiconductor devices. It is used in optical coatings and as a high-K dielectric in DRAM capacitors. It is also used as a refractory material in the insulation of devices such as thermocouples and in the passive cooling of building mechanisms. Hafnium(IV) oxide also shows potential for nanoscale bio-related applications
50 lb. bags, poly-lined fiber drums, and bulk bags
Hafnium(IV) Oxide (HfO₂) TSCA (SARA Title III) Status: Unknown
For further information; please call the EPA Office of Chemical Safety and Pollution Prevention (OCSPP) at 202-564-2902.
Hafnium(IV) Oxide (HfO2) CAS Number: 12055-23-1