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Sputtering Targets

Sputtering Targets are necessary raw materials used in physical vapor deposition (PVD) or chemical vapor deposition (CVD). Sputtering is a physical process commonly used for thin film coating, ion etching, and analytical techniques.
Typical Applications

Coatings created through sputtering targets can be used in semiconductors, glass coating, decorative coating, and solar cell coating as well as ion etching and some analytical techniques.

Packaging Options



Classification would be dependent on each elemental sputtering target

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  • Aluminum Sputtering Target
  • Aluminum-Chromium Sputtering Target
  • Chromium Sputtering Target
  • Gold Sputtering Target
  • Hafnium Sputtering Target
  • Molybdenum Oxide Sputtering Target
  • Molybdenum Sputtering Target
  • Molybdenum-Niobium Sputtering Target
  • Molybdenum-Sodium Sputtering Target
  • Molybdenum-Tantalum Sputtering Target
  • Molybdenum-Tungsten Sputtering Target
  • Niobium Sputtering Target
  • Platinum Sputtering Target
  • Silicon Dioxide Sputtering Target
  • Silicon Sputtering Target


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